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Ion Implantation in Diamond, Graphite and Related Materials

Ion Implantation in Diamond, Graphite and Related Materials

Prof. M. S. Dresselhaus Ph. D., Prof. R. Kalish Ph. D. (auth.)
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Carbon has always been a unique and intriguing material from a funda­ mental standpoint and, at the same time, a material with many technological uses. Carbon-based materials, diamond, graphite and their many deriva­ tives, have attracted much attention in recent years for many reasons. Ion implantation, which has proven to be most useful in modifying the near­ surface properties of many kinds of materials, in particular semiconductors, has also been applied to carbon-based materials. This has yielded, mainly in the last decade, many scientifically interesting and technologically impor­ tant results. Reports on these studies have been published in a wide variety of journals and topical conferences, which often have little disciplinary overlap, and which often address very different audiences. The need for a review to cover in an integrated way the various diverse aspects of the field has become increasingly obvious. Such a review should allow the reader to get an overview of the research that has been done thus far, to gain an ap­ preciation of the common features in the response of the various carbon to ion impact, and to become aware of current research oppor­ allotropes tunities and unresolved questions waiting to be addressed. Realizing this, and having ourselves both contributed to the field, we decided to write a review paper summarizing the experimental and theoretical status of ion­ implantation into diamond, graphite and related materials.

种类:
年:
1992
出版:
1
出版社:
Springer-Verlag Berlin Heidelberg
语言:
english
页:
202
ISBN 10:
3642771734
ISBN 13:
9783642771736
系列:
Springer Series in Materials Science 22
文件:
PDF, 5.37 MB
IPFS:
CID , CID Blake2b
english, 1992
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